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| 86 | A fabrication technique for top-gate ZnO nanowire field-effect transistors by a photolithography process |
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Microelectronics Engineering, Vol.84, pp1622-1626 (2007.5)
Kihyun Keem, Jeongmin Kang, Changjoon Yoon, Donghyuk Yeom, Dongyoung Jeong, Byungmoo Moon, Sangsig Kim
